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2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For

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Buy cheap 2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device from wholesalers
  • Buy cheap 2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device from wholesalers
  • Buy cheap 2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device from wholesalers
  • Buy cheap 2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device from wholesalers

2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device

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Brand Name:zmkj
Model Number:4inch--N,4H-semi
Price:by required
Delivery Time:10-20days
Supply Ability:100pcs/months
Company Data
Verified Supplier
Contact Person Wang
Business Type: Manufacturer Agent Importer Exporter Trading Company
Officials: Room.1-1805,No.1079 Dianshanhu Road,Qingpu Area Shanghai city, China /201799
Quality: Quality Certifitation Available
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Product Details Company Profile
Product Details

4inch dia100m 4H-N type Production grade DUMMY grade SiC substrates,Silicon Carbide substrates for semiconductor device,


Application areas


1 high frequency and high power electronic devices Schottky diodes,


JFET, BJT, PiN, diodes, IGBT, MOSFET


2 optoelectronic devices: mainly used in GaN/SiC blue LED substrate material (GaN/SiC) LED


Advantagement

• Low lattice mismatch
• High thermal conductivity
• Low power consumption
• Excellent transient characteristics
• High band gap


Silicon Carbide SiC crystal substrate wafer carborundum

SILICON CARBIDE MATERIAL PROPERTIES

Product Name:Silicon carbide (SiC) crystal substrate
Product Description:2-6inch
Technical parameters:
Cell structureHexagonal
Lattice constanta = 3.08 Å c = 15.08 Å
PrioritiesABCACB (6H)
Growth methodMOCVD
DirectionGrowth axis or Partial (0001) 3.5 °
PolishingSi surface polishing
Bandgap2.93 eV (indirect)
Conductivity typeN or seimi ,high purity
Resistivity0.076 ohm-cm
Permittivitye (11) = e (22) = 9.66 e (33) = 10.33
Thermal conductivity @ 300K5 W / cm. K
Hardness9.2 Mohs
Specifications:6H N-type 4H N-type semi-insulating dia2 "x0.33mm, dia2" x0.43mm,dia2''x1mmt, 10x10mm, 10x5mm Single throw or double throw, Ra <10A
Standard Packaging:1000 clean room, 100 clean bag or single box packaging

2. substrates size of standard

4 inch diameter Silicon Carbide (SiC) Substrate Specification

GradeZero MPD GradeProduction GradeResearch GradeDummy Grade
Diameter100.0 mm±0.5 mm
Thickness350 μm±25μm (200-500um thickness also is ok)
Wafer OrientationOff axis : 4.0° toward <1120> ±0.5° for 4H-N/4H-SI On axis : <0001>±0.5° for 6H-N/6H-SI/4H-N/4H-SI
Micropipe Density≤1 cm-2≤5 cm-2≤15 cm-2≤50 cm-2
Resistivity4H-N0.015~0.028 Ω•cm
6H-N0.02~0.1 Ω•cm
4/6H-SI≥1E5 Ω·cm
Primary Flat and length{10-10}±5.0° ,32.5 mm±2.0 mm
Secondary Flat Length18.0mm±2.0 mm
Secondary Flat OrientationSilicon face up: 90° CW. from Prime flat ±5.0°
Edge exclusion3 mm
TTV/Bow /Warp≤15μm /≤25μm /≤40μm
RoughnessPolish Ra≤1 nm ,CMP Ra≤0.5 nm
Cracks by high intensity lightNone1 allowed, ≤2 mmCumulative length ≤ 10mm, single length≤2mm
Hex Plates by high intensity lightCumulative area ≤1%Cumulative area ≤1%Cumulative area ≤3%
Polytype Areas by high intensity lightNoneCumulative area ≤2%Cumulative area ≤5%
Scratches by high intensity light3 scratches to 1×wafer diameter cumulative length5 scratches to 1×wafer diameter cumulative length5 scratches to 1×wafer diameter cumulative length
edge chipNone3 allowed, ≤0.5 mm each5 allowed, ≤1 mm each
Contamination by high intensity lightNone

Sic wafer & ingots 2-6inch and other customized size also can be provided.


3.Pictures of delivery Products before

2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device

2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device

Delivery & Package

2inch 3inch Dia100m 4H-N Type Silicon Carbide Wafer Production Grade For Semiconductor Device


Company Profile

SHANGHAI FAMOUS TRADE CO.,LTD

    SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.
   We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components widely used in electronics, optics, optoelectronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects.
    It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputatiaons.
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